A liquid precursor for the growth of platinum
Platinum Precursor for Chemical Vapour Deposition In 2003, the compound PtMe3(MeCp) enabled the first Pt metal ALD process and has…
Published on the 17th of December 2020
New bubbler for ALD and CVD
By popular demand we have continued to expand our selection of electro polished stainless steel bubblers to meet your metal…
Published on the 14th of September 2016
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