A liquid precursor for the growth of platinum
Platinum Precursor for Chemical Vapour Deposition In 2003, the compound PtMe3(MeCp) enabled the first Pt metal ALD process and has…
Published on the 17th of December 2020
Volatile ALD & amp; CVD magnesium precursors for non-volatile memory and flexible display applications
The escalating struggle with further scaling of integrated circuit chips, on account of certain feature sizes in advanced chips gradually…
Published on the 24th of April 2020
Strem Offers One of the Most Promising Ruthenium Amidinate Precursors for Growing Ru ALD or CVD Films
Estimating Rising Demand for Ru Thin-films in the Next Generation Chips The saturation of Moore’s curve while following systematic…
Published on the 6th of November 2018
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