Volatile ALD & amp; CVD magnesium precursors for non-volatile memory and flexible display applications
The escalating struggle with further scaling of integrated circuit chips, on account of certain feature sizes in advanced chips gradually…
Published on the 24th of April 2020
High quality LaLuO3, ALD grown from Lanthanum and Lutetium amidinates, is an ideal gate dielectric to replace SiO2 in MOSFETs
Lanthanum and lutetium amidinate precursors are used to grow desirable high-k ternary oxides by atomic layer deposition Silicon-based metal oxide…
Published on the 4th of March 2020
Ytterbium Amidinate is a New Alternative Precursor for the ALD Yb Doping of Fiber Lasers and Growth of Oxide Dielectrics
Ytterbium Precursors for ALD Growth Applications in the Fabrication of Advanced Optical and Electrical Devices Ytterbium continues to play an…
Published on the 12th of December 2019
Strem Chemicals UK offer prepackaged precursors in ALD cylinders!
PEALDn processes employing Strem Chemicals supplied TDMASn precursor presented by diverse groups of researchers Atomic layer deposition (ALD) using…
Published on the 4th of December 2019
Take a look at our 450+ CVD/ALD precursors available from Strem Chemicals UK
Strem offers Hafnium Metal Alkylamide ALD Precursors for Emerging Memory Applications In recent years, hafnium oxide (as well as doped…
Published on the 30th of July 2019
Photocatalysts available in the UK
Strem Chemicals UK is providing free of charge another new booklet where you will find our selection of photocatalysts, related…
Published on the 20th of June 2018
Strem Chemicals Catalogue is available as a New Digital Version!
Due our large increases in the amount of chemicals and materials and in the spirit of our growing digital…
Published on the 29th of August 2017
Many new products in our new booklet from Strem Chemicals in the UK and Ireland
MOCVD, CVD & ALD Precursor Our products are used for research and development, as well as commercial scale applications, especially…
Published on the 27th of June 2017
Strem Chemicals adds vanadium to its extensive list of precursors available in the UK and Ireland
One of the many organometallic compounds produced by Strem Chemicals is Tetrakis(ethylmethylamino) vanadium(IV) (TEMAV) CAS 791114-66-4 Strem no 23-0365 a…
Published on the 12th of May 2017
MOCVD, CVD and ALD Precursors for use in Micro & Nano electronics
Nano layers of metals, semiconducting and dielectric materials are crucial components of modern electronic devices, high-efficiency solar panels, memory systems,…