The escalating struggle with further scaling of integrated circuit chips, on account of certain feature sizes in advanced chips gradually…
Lanthanum and lutetium amidinate precursors are used to grow desirable high-k ternary oxides by atomic layer deposition Silicon-based metal oxide…
Ytterbium Precursors for ALD Growth Applications in the Fabrication of Advanced Optical and Electrical Devices Ytterbium continues to play an…
PEALDn processes employing Strem Chemicals supplied TDMASn precursor presented by diverse groups of researchers Atomic layer deposition (ALD) using…
Strem offers Hafnium Metal Alkylamide ALD Precursors for Emerging Memory Applications In recent years, hafnium oxide (as well as doped…
Strem Chemicals UK is providing free of charge another new booklet where you will find our selection of photocatalysts, related…
Due our large increases in the amount of chemicals and materials and in the spirit of our growing digital…
MOCVD, CVD & ALD Precursor Our products are used for research and development, as well as commercial scale applications, especially…
One of the many organometallic compounds produced by Strem Chemicals is Tetrakis(ethylmethylamino) vanadium(IV) (TEMAV) CAS 791114-66-4 Strem no 23-0365 a…
Nano layers of metals, semiconducting and dielectric materials are crucial components of modern electronic devices, high-efficiency solar panels, memory systems,…